1964

• First high acceleration spin coater.
• First Spin coater with electronic speed rotation.
• First vacuum-to-chuck interlock, first quick braking.

1966

• First successful pump for photoresist.
• First commercial spin developer for photoresist.
• First mechanical scrubber for substrate surfaces.

1973

• First Automated surface scrubber using polishing cloth technique.

1975

• Developed first large substrate spinner for 14" diameter glass master discs for laser disc research.

1977

• Initiated successful edge rounding of semiconductor substrates in the United States. Increased IC yields by 25%.

1985

• Introduced "Inhibited Drying Spin Coating" techniques for improved coatings, especially on rectangular or odd-shaped substrates.

1990

• Improved scrubbing techniques for large and rectangular substrates, using small disposable polishing cloth discs.

1998

• New PWM32 Spin controller for low cost R & D use.
• New HDP98 High purity fluid dispenser.
• New Substrate lifter/alignment system.