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Headway Research, Inc.
Headway Research, Inc.

PWM32-PS-R790 Spinner System



The model PWM32 Spin Controller has been upgraded and new product is now called model PWM50. We buy used equipment and factory re-furbish it at times, so the PWM32 may linger in our terminology and sales material for a considerable time. References to the PWM32 will be updated as soon as practical.

See the special page explaining the main differences in the two models.

PS Motor: Up to 10,000 rpm, for relatively light loads such as silicon wafers, small photomasks, etc.

Bowl with Moving ArmR790 Bowl: 7.9-inch I.D., reduced by a removable splash deflector to a maximum recommended substrate dimension of 5 inches. For a 5-inch diameter or diagonal substrate, the accessory substrate lifter/loader is recommended because of the limited clearance between the substrate and splash deflector during loading and unloading. Larger substrates may be handled by removing the splash deflector but undesirable backsplash or splatter from the bowl may be the result. Headway recommends the next larger bowl, the CB15, for larger than 5" maximum dimension substrates.

The R790 motor package has two drain lines from the stainless steel bowl. The bowl is surrounded by a rectangular stainless steel plenum with an air exhaust port for pulling air down through the bowl and out of the lab environment. The air exhaust rate becomes a part of the spin coating process, and in critical coating applications, should be monitored and regulated. A port on the exhaust tube provides for attaching a Magnehelic (or other) sensor for visual or automatic monitoring of the air exhaust status. For closed-chamber inhibited drying spin coating (see HRI Technical Note H-18-93 on IDS), an accessory exhaust damper and bowl cover is available. With the bowl covered during coating, the PWM32 controller can be programmed to close the accessory exhaust damper during a process.

An accessory substrate lifter and alignment tool is available for the R790 package. A lifter rod working through the motor shaft will lift a substrate out of the bowl. When loading, the substrate is placed on an alignment platform, the lifter lifts the substrate out of the alignment platform and the operator rotates the platform away from above the bowl. The lifter lowers the substrate onto the chuck, properly centered. This accessory eliminates the tedious manual process of reaching into the bowl to load and unload substrates and the problem of visual centering and contamination.

The R790 motor package can be dropped into a cutout in a user's worktable, or Headway can supply a completely packaged stand-alone system. When automated dispensers and other accessories are used, it is highly recommended that a complete turnkey package be purchased from Headway. For basic spinners without accessories, an optional portable stand for the motor package is also available.


The New PWM32 Spinners are Available in Four Standard Motor/Bowl Configurations

  • Model PWM32-PS-R790, up to 10,000 rpm for relatively light loads such as silicon wafers, small photomasks, etc. and substrates up to 5-inch maximum
  • Model PWM32-PS-CB15, up to 10,000 rpm for relatively light loads such as silicon wafers, small photomasks, etc. and substrates up to a recommended 8-inch maximum
  • Model PWM32-BD-CB15, up to 2,500 rpm for heavy loads such as compact disk masters, thick E-beam masks, LCD panels, substrates requiring high inertia chucks, etc. and substrates up to a recommended 12-inch maximum
  • Model PWM32-BD-LS22, the next larger bowl for substrates larger than 12-inches, or for heavy substrates at higher than 2,500 rpm or consider the IT22 (a different family of 22-inch I.D. Spinners).

For larger than 12-inch substrates, or for heavy substrates at higher than 2,500 rpm, HRI recommends the next larger bowl, the LS22 or IT22 (a different family of 22-inch I.D. Spinners).




sales@headres.com

Headway Research, Inc.
3637 Marquis Dr, Ste #102
Garland, Texas 75042 U.S.A.

Phone (972) 272-5431
Fax (972) 272-7817